1. Ji-Liang Zhang, Wei-mu Xu, Zhuan-ke Chen, Jiang-ping Tu.Study on the Electrical Life of AgSnO2 Contacts in Automotive Inductive Load Applications. ICREPEC 3rd Proceedings 2009
2. ZHANG Ji-Liang, LI Jian, LUO Lai-ma, WO Yin-hua.Microstructure and morphology of SiOx film deposited by APCVD. Journal of Alloy and Compound. 2009, 469(12):535-538 (SCI, EI)
3. Zhang Ji-Liang, Li Jian. A Simple Approch of Preparing Amorphous SiOx Film on Aluminum Substrate. Materials Letters. 2007, 61(29):5110-5112 (SCI, EI)
4. ZHANG Ji-liang, SUN Xue-peng, LI Jian, WO Yin-hua.Mechanical properties of SiOx film on aluminum substrate. Transactions of materials and heat treatment. 2007, 28(Supplement):275 -278. (EI)
5. Zhang Ji-Liang, Li Jian, Wo Yin-Hua, Wang You-Wen, Gan Zheng-Hao. Bending test and bonding mechanism analysis of the SiOx film on aluminum substrate. Transactions of materials and heat treatment. 2006, 27(1):68-70. (EI)
6. Zhang Ji-Liang, Wo Yin-Hua, Li Jian; Gan Zheng-Hao, Xu Ya-Bo. Optical properties of SiOx film on aluminum substrate prepared by APCVD. Journal of Zhejiang University (Engineering Science). 2005, 39(8):1243-1246. (EI)
7. ZHANG Ji-liang, LI Jian, WO Yin-hua, WANG You-wen, GAN Zheng-hao. Analysis of the SiOx Film Microstructure on Al Substrate by APCVD Process. 14th Congress of International Federation for Heat Treatment and Surface Engineering. Transactions of materials and heat treatment. 2004, 25(5):847-850. (EI)
8. Zhang Ji-Liang, Li Jian, Wo Yin-Hua, Wang You-Wen, Shen Fu-Chu, Gan Zheng-Hao. Microstructure and Properties of SiOx Film on Aluminum Substrate by CVD Process. Chinese Journal of Nonferrous Metals. 2004, 14(6):961-966(EI)
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